CFN Fabrication ISO5 Lab
FESEM
Model: JSM-7610F
Field Emission Scanning Electron Microscope (FESEM) is a microscope that works with electrons (particles with a negative charge) instead of light. It is used to visualize very small topographic details on the surface or entire or fractioned objects.
Mask Writer
Model: Dilase 250
This equipment is mainly used for prepare masks for microscale patterns.
Double sided Mask Aligner
Model: EVG620NT
This equipment helps in high precision single and double sided alignment. It also aids in wafer-to-wafer alignment for wafer bonding applications.
CFN Fabrication ISO6 Lab
Electro Spinning Device
Model: Super ES-2
Electrospinning is a highly versatile method to process solutions or melts, mainly of polymers, into continuous fibers with diameters ranging from a few micrometers to a few nanometers.
RIE
Model: EVG620NT
Reactive Ion Etching is a dry etching process used in semiconductor manufacturing and microfabrication to precisely pattern and etch thin films on substrates using a combination of plasma and reactive gases. RIE is highly selective and allows for fine control over etching depth and profile, making it essential for creating high-resolution features in integrated circuits and microdevices.
RF Magetron Sputtering
Model: QPREP400
To develop thin films applied to a wide range of domains, from sensors and electrodes used in biomedical and energy sectors to thermo-optical applications in aerospace domains
Thermal evaporator
A vacuum-based deposition system used to create thin films by thermally evaporating materials onto substrates, enabling uniform coatings for device fabrication and material research.
Laser Micro-Machining
Model: Clark MXR Inc,Impulse Laser
It's a precise material processing technique that uses a laser to cut, drill, or engrave materials with high precision.Femtosecond pulse LASER machining device for micro-patterning on material surfaces.
PECVD
PECVD, or Plasma-Enhanced Chemical Vapor Deposition, is a process used in semiconductor manufacturing to deposit thin films of various materials onto a substrate.
CFN Electrical Characterization Lab
Cryogenic Probe station
A Cryogenic Probe Station is used to characterize electronic devices at extremely low temperatures, typically down to a few Kelvin. It allows for electrical measurements on semiconductor devices such as superconducting devices and high electron mobility transistors, enabling research and development in areas such as quantum devices and low-temperature electronics.
Pulsed Laser Deposition
Model: Excel Instrument
It is a thin film deposition technique used to grow high-quality thin films of various materials onto substrates. PLD is widely used in research and industry for the deposition of complex oxide materials, superconductors, ferroelectrics, and other thin film structures.
CFN Material Characterization Lab
Raman
Model: CPX100
To develop thin films applied to a wide range of domains, from sensors and electrodes used in biomedical and energy sectors to thermo-optical applications in aerospace domains.
Molecular Printing System
Model: Bioforce Nano eNabler 5.02
This equipment is mainly used for surface patterning of organic and inorganic material.
Wire bonder
Model: HB16
A wire bonder is used in semiconductor device manufacturing to make electrical connections (bonds) between a semiconductor die and its package or substrate.
CFN Electrical Characterization Lab
Confocal
Model: JSM-7610F
This equipment is used for Imaging, Z-stack, Airyscan mode imaging, Spectra analysis, Live cell imaging, Bleaching experiments and FCS can be done using confocal microscope.
Semiconductor and Nanoelectronics Device Labratory
Mist -CVD System
To develop metal-oxide or metal-sulphide thin films applied to a wide range of applications, like photo-detector, LED, solar-cell and gas-sensors.
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Fume Hood
This equipment ventilates enclosure that ensures safe handling of volatile chemicals and hazardous vapors, maintaining a clean and contaminant-free workspace for material and device research.
Automatic Spin Coating System
Model: EZ_SPIN A2 (APEX Systems)
This is an automated system used for uniform thin-film deposition on substrates, enabling prec​
In plane and Out of plane Electromagnetic Probe Station
A versatile measurement setup used to characterize magnetic and spintronic devices under controlled in-plane and out-of-plane magnetic fields, enabling precise electrical and magneto-transport studies.